Excel Metal & Engg Industries
Excel Metal & Engg Industries
Mumbai, Maharashtra
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SPUTTERING TARGET

SPUTTERING TARGET,
ROTATABLE SPUTTERING TARGETS,
THIN FILM, FOIL,
DEPOSITION MATERIAL,
EVAPORATION MATERIALS,

Sputtering Deposition·
Uses & Applications for Sputtering Targets·
Deposition Methods that do not Require Sputtering Targets

Compound Targets

Compound Targets
  • Compound Targets
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Approx. Price: Rs 2,999 / Piece(s)

A wide selection of compound based sputtering targets: oxides, nitrides, borides, sulfides, selenides, tellurides, carbides, crystalline and composite mixtures.

compound target production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

To achieve the best performance and to prevent the target from cracking or over-heating, we strongly recommend bonding any material target to a backing plate.
Please visit our Bonding Service Page for more information.

compound target production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

Borides are generally used for wear-resistant films, Titanium boride and zirconium boride films increase life time of cutting tools. Lanthanum boride coatings are thermionic conductors.
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Pure Metal Targets

Pure Metal Targets
  • Pure Metal Targets
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Approx. Price: Rs 199 / Piece(s)
Pure Metal Targets

metal sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photo conductive films, lubricant films, magnetic and memory elements to name but a few.

Manufacturing processes we use depend on the properties of the target material and its application. Fabrication methods vary from vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed and forged.

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Our metal targets are offered in various purity levels to suit your specific requirements, with the minimum purity of 99. 9% up to 99. 99% for some metals like Aluminium, Copper, Molybdenum and ultra-high purities of 99. 995%-99. 9995+% for Aluminium, Tellurium, Titanium, Cadmium, Silicon and Molybdenum. Although purity levels higher than required increase material costs, in some instances, the use of too low a purity can result in poor film quality. If you have requirements to specific impurities, we may be able to control them within the target.

In addition to standard configurations we welcome custom design target requests.
To achieve the best performance and to prevent the target from cracking or over-heating, we strongly recommend bonding any material target to a backing plate.
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Sputtering Target

Sputtering Target
  • Sputtering Target
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Approx. Price: Rs 1,999 / Piece(s)
Sputtering Target.
We supply metal and alloy sputtering target for PVD film coating industry with kinds of materials which purity ranges from 99.9% to 99.999%

Available materials:
Aluminum
Chromium
Copper
Molybdenum
Nickel, Ni-Cr, Ni-V
Niobium, Nb-Zr
Silicon
Sliver / Gold
Tantalum, Ta-W
Titanium, Ti-Al, Ti-Cr, Ti-Ni, Ti-Si, Ti-Zr
Tungsten, W-Re
Zirconium, Zr-Nb
Other materials and alloys upon request

Surface:
Precisely machined / ground, shinny bright surface
Roughness Ra 1.6, 0.8

Forms for sputtering target:
Circular / planar / tubular
Custom-made form as per drawing

Specification:
As per general industry standard or customer’s specific demand
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Gold (Au) Sputtering Targets

Gold (Au) Sputtering Targets
  • Gold (Au) Sputtering Targets
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Approx. Price: Rs 99,999 / Piece(s)
Gold (Au) Sputtering Targets

Specifications
Material TypeGold
SymbolAu
Atomic Weight196.966569
Atomic Number79
Color/AppearanceGold, Metallic
Thermal Conductivity320 W/m.K
Melting Point (°C)1,064
Coefficient of Thermal Expansion14.2 x 10-6/K
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Semiconductor Wafers

Semiconductor Wafers
  • Semiconductor Wafers
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Approx. Price: Rs 999 / Piece
Banking on the technical expertise of our professionals, we trade and supply a quality tested array of Semiconductor Wafers. The Semiconductor Wafers we offer is suitable to meet the applications of various applications.

Silicon waferOxide waferSOI wafer
III-V wafer ( GaSb / InAs )II-VI wafer ( CdS / ZnS )GaAs/InP epitaxial wafer
Sapphire waferSiC waferGaN epitaxial wafer
Single crystal waferMgO waferSrTiO3 wafer
Crystal SiO2 waferGlass waferQuartz wafer
Ge waferAl2O3 / AlN / ZrO2 waferSputter target
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Silicon Wafer

Silicon Wafer
  • Silicon Wafer
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Approx. Price: Rs 99 / Piece

Keeping in mind diverse requirements of the clients, we are presenting a quality approved array of Silicon Wafers. The Silicon Wafers we offer is recommended by the clients for their wide use. These products are sourced from leading manufacturers of the market, who make use of quality material to manufacture these products.

Features:

  • Different orientation
  • Single side or double side polished
  • Resistivity 1-10ohm
  • Customized specification can also be offered from our end
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Additional Information:

  • Item Code: EMEI-SIL-WAFER
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Reach Us
Shyam Choudhary (Proprietor)
No. 177/181, JT Building, Dr. M. G. Mahimtura Marg 3rd Kumbharwada Lane
Mumbai- 400004, Maharashtra, India


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